1. Wide production operating window, enabling stable nickel plating with P content ranging from 8-11% 2. Low solution attack on solder mask 3. Ni bath: 3.5-4MTO for selective (4.5MTO for general); Au bath: 20 MTO for selective, (30MTO for general); less waste discharge 4. Dense and uniform nickel layer with minimal corrosion 5. Excellent resistance to skip plating or bleeding plating , capable of 35μm pitch
相關產品
Chemical Reagents
Specialty Chemicals
ENIPIG
PTH
Via Filling Electroplating
Pulse Electroplating
SF-Bond (Weak etchant)
Browning Solution
OSP
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